The global market for focused ion beam has been covered under the scope of this report. Focused ion beam systems have been commercially produced primarily for large semiconductor manufacturers for more than twenty years. While the application of Focused ion beams was mainly restricted to the semiconductor industry, in the recent years, this instrument is finding usage in metallurgy, biology, polymers, composites, ceramics and pharmaceuticals among others. Focused ion beams achieved widespread application in the fields of material science and biological science when it was coupled with a scanning electron microscope column to develop a dual beam FIB system.
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The global Focused ion beam market is primarily driven by factors such as increasing application of focused ion beam systems in material science, increase in demand for ion beam lithography and an increase in demand for failure analysis equipment. Focused ion beams are used in the field of material science, both as a microscope and as a specimen preparation tool. Focused ion beams used in lithography offer high resolution patterning and offer significant advantages over electron beam lithography in terms of backscattering, proximity effects and resist sensitivity. Focused ion beam systems are used as failure analysis equipment commonly in the semiconductor industry to detect the common causes of failure such as manufacturing defects, design errors, misuse and assembly errors among others. Considering these positive factors, the demand for Focused ion beam systems is set to rise during the forecast period from 2015 - 2021.
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The global Focused ion beam market, by ion sources is segmented broadly into four major segments, namely gallium, gold, iridium and others (including gas field ionization sources and liquid metal alloy ion sources). In terms of revenue, the gallium ion source was the largest contributor to the market, followed by iridium in 2014. Currently, most of the FIB instruments are equipped with liquid metal ion source (LMIS) with emit gallium ions. Gallium LMIS FIB technology is preferred over other ion sources owing to its stability, long source lifetime, low melting point and high mass ions for fairly rapid machining.
The global Focused ion beam market by applications is divided into six segments, namely: circuit edit, device modification, material science, nanofabrication, failure analysis and others (including biological science). Circuit editing and material science are the major application areas of Focused ion beams and they are positively impacting the growth of the global market. FIB circuit editing helps in prototyping new devices without expensive and time consuming masking set fabrication. FIB-based systems are widely deployed in material science laboratories for generating 3D images and specimen preparation.
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The global Focused ion beam market has been bifurcated into five broad geographic regions: North America, Europe, Asia Pacific, Latin America and Middle East and Africa. North America occupied the largest share of the market in 2014 accounting for 39.2%. The market in this region is primarily driven by the high penetration of Focused ion beam systems in semiconductor and manufacturing industries. Asia Pacific acquired the second largest share of the market globally, accounted for 26.2% in terms of revenue in 2014. The market for Focused ion beams in the region is primarily driven by high concentration of semiconductor industries in emerging countries such as China, Taiwan, Japan, South Korea and India.
Some of the key players in the Focused ion beam market are Hitachi High-Technologies Corporation (Tokyo, Japan), FEI (Hillsboro, United States), Evans Analytical Group (California, United States), Carl Zeiss AG (Jena, Germany) and the Fibics Incorporated (Ottawa, Canada) among others.