Tiedote -
Picosun predicts industrial breakthrough for ALD in 2011
“Year 2010 has been a remarkable year for the technique and science of ALD,” says Kustaa Poutiainen, Picosun’s Chairman of the Board of Directors and CEO. “All through 2010 we have seen clear and increasingly convincing signs of a completely novel group of industrial customers emerge, all eager to learn from the unequalled experience Picosun possesses as the global ALD powerhouse.”
“We are extremely pleased to have Dr. Tuomo Suntola, the inventor of ALD still play a crucial part as member of the board of directors of Picosun. Should anyone perform a paternity test to modern ALD, Dr. Suntola’s scientific DNA would shine through from every sample. He is actively taking part in Picosun’s tireless work developing ALD from something which shows great promise for tomorrow into today’s mainstream industrial production technique opening bold visions for the future,” Poutiainen says.
ALD is already in use in large scale production of semiconductors, has introduced itself properly in electronics and solar, and finds its way into many other fields and industries. Picosun recently joined a European group of first-tier scientific institutions and companies who are building cleaner chemical and pharmaceutical industry. “Cleantech as whole is clearly one major 2011 direction for a successful marriage of ALD and future technologies,” Poutiainen emphasizes.
Spearheading the global move towards increasing utilization of ALD techniques in industrial production, Picosun will also continue its remarkable growth path as a company. Encouraged by sustained strong demand for Picosun SUNALE™ ALD systems the board of Picosun raised the forecast for 2010 – 2011 turnover significantly in its December session (Picosun’s fiscal year is from May to April).
“Having a clear shot at reaching a size fifty times larger than what we were only a couple of years ago underline the quality, persistence and determination of people who have built the company: our staff and board members,” Kustaa Poutiainen says. "Every person at every level of the company aims to be the very best in what he/she does so that Picosun and its products continue to be the best in the world both now and in the future."
Picosun Oy is a Finland-based global manufacturer of state-of-the-art ALD systems for micro- and nanotechnology applications. Picosun represents continuity to over three decades of ALD reactor design and manufacturing in Finland. Picosun is based in Espoo, Finland and has its US headquarters in Detroit, Michigan. SUNALE™ ALD process tools are installed in various universities, research institutes and companies across four continents. Picosun Oy is a part of Stephen Industries Inc Oy.
Dr Tuomo Suntola, inventor of ALD technology, is Member of the Board of Directors of Picosun. World’s most experienced ALD reactor designer Sven Lindfors is Picosun´s Chief Technology Officer and one of the founders of the company.
Additional information:
Picosun Oy, Mr. Juhana Kostamo, Managing Director
Tietotie 3, FI-02150 Espoo, Finland
Tel. +358 50 321 1955;
Fax. +358 20 722 7012;
e-mail: info (at) picosun.com
Aiheet
- Teollisuus, valmistus
Kategoriat
- ald
- atomic layer deposition
- detroit
- espoo
- finland
- juhana kostamo
- picosun
- kustaa poutiainen
- tuomo suntola
- nanotechnology
- electronics industry
- manufacturing
- industrial applications
Picosun Oy is a Finland-based global manufacturer of state-of-the-art ALD systems for micro- and nanotechnology applications. Picosun represents continuity to over three decades of ALD reactor manufacturing in Finland (ALD = Atomic Layer Deposition). Picosun is based in Espoo, Finland and has its US headquarters in Detroit, Michigan. SUNALE™ ALD process tools are installed in various universities, research institutes and companies across four continents. Picosun Oy is a part of Stephen Industries Inc Oy.
ALD is a surface controlled layer-by-layer process based on self-terminating gas-solid reactions. It is uniquely suited to produce high-performance gas barrier coatings on various materials as it allows preparation of dense and pinhole-free inorganic films that are uniform in thickness even deep inside pores, trenches and cavities of various dimensions. The other advantages of the ALD include low impurity content and mild deposition conditions in terms of temperature and pressure. There is a wide range of ALD-grown materials and commercial applications, from catalysts to electroluminescent displays in microelectronics and beyond. In addition to forming efficient barriers certain ALD-grown materials can also act as conductive enablers.
ALD was invented in 1974 by Dr. Tuomo Suntola, today serving as Member of the Board of Directors of Picosun. Picosun founder and CTO Sven Lindfors has been designing ALD systems continuosly since 1975.
